2004: Papers, Journals, Books

1.Evolution of water vapor from indium-tin-oxide transparent conducting films fabricated by dip coating process

• Y. Sawada*1, S. Seki*1, M. Sano*2, N. Miyabayashi*2, K. Ninomiya*3, A. Iwasawa*3, T. Tsugoshi*4, R. Ozao*5 and Y. Nishimoto*6
• *1)Tokyo Polytechnic University, *2)ESCO Co. Ltd., *3)TOTO Ltd., *4)National Institute of Advanced Industrial Science and Technology, *5)North Shore College of SONY Institute, *6)Kanagawa University
• Journal of Thermal Analysis and Calorimetry, Vol. 77 (2004) 751-757

2004: Key Points of the Society

1.Water sorbability of low-k dielectrics measured by thermal desorption spectroscopy

• Hiroshi Yanazawa, Takuya Fukuda, Yoko Uchida, Ichiro Katou
• Association of Super-Advanced Electronic Technologies
• Surface Science,566-568(2004)pp566-570

2.Reaction of Hydrogen-Desorbed Si(100) Surfaces with Water during Heating and Cooling

• Shinichi URABE, Kazuo NISHIMURA, Satoru MORITA and Mizuho MORITA
• Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
• Jpn. J. Appl. Phys,43,8242(2004)

3.Analysis of firing process of titania gel films fabricated by sol-gel process

• Nishide Toshikazu*1, Yabe Takayuki*1, Miyabayashi Nobuyoshi*2, Sano Makiko*2
• 1 Department of Materials Chemistry and Engineering, College of Engineering, Nihon University, *2 ESCO Ltd.
• Thin Solid Films,467,43(2004)

4. Method for Determining the Pattern Coefficient of H₂O in Thermal Desorption Analysis

• Satoko Tokiwa*1, Toshikazu Nishide*2, Akio Hashizume*3, Nobuyoshi Miyabayashi*3
• *1 Institute of Applied Physics, University of Tsukuba
• *1 Next-Generation Engineering Technology Research Center, Faculty of Engineering, Nihon University, *2 Department of Materials and Chemical Engineering, Faculty of Engineering, Nihon University, *3 Electronic Science Co., Ltd.
• J. Mass Spectrom. Soc. Jpn., 52, 45 (2004)

 

2003: Papers, Journals, Books

1.Different Adsorption States between Thiophene and α-Bithiophene Thin Films Prepared by Self-Assembly Method

• Eisuke ITO, Jaegeun NOH and Masahiko HARA
• Local Spatio-Temporal Functions Laboratory, Frontier Research Systems, RIKEN
• Jpn. J. Appl. Phys., 42, 852 (2003)

2. Characteristics of Bottom Gate Thin Film Transistors with Silicon-rich poly-Si₁₋_xG_x and poly-Si Fabricated by Reactive Thermal Chemical Vapor Deposition

• Kousaku Shimizu, JianJun Zhang, Jeong-Woo Lee, and Jun-ichi Hanna
• Imaging Science and Engineering Laboratory, Tokyo Institute of Technology 4259 Nagatsuta Midoriku Yokohama 226-8503 Japan
• Materials Research Society Symposium Proceedings, Vol. 762, pp. 253-258 (2003)

3. Quantitative Evaluation of the Photoinduced Hydrophilic Conversion Properties of TiO₂ Thin Film Surfaces by the Reciprocal of Contact Angle

• Nobuyuki Sakai, Akira Fujishima, Toshiya Watanabe, and Kazuhito Hashimoto
• *1)Research Center for Advanced Science and Technology, The University of Tokyo
• *2)Department of Applied Chemistry, School of Engineering, The University of Tokyo
• J. Phys. Chem. B, 2003, 107 (4), pp.1028-1035

2003: Key Points of the Society

 

1.Water sorbability of Low-k dielectrics measured by Thermal Desorption Spectroscopy

• Hiroshi Yanazawa, Takuya Fukuda, Yoko Uchida, and Ichiro Katou
• Association of Super-Advanced Electronic Technologies (ASET)
• European Conference on Surface Science (ECOSS22), Abstract ID:17017(2003)

2. Surface fluorination of MgO protective film to reduce chemical reactivity with H₂O and CO₂

• Hideaki Sakurai, Ginjiro Toyoguchi, Yoshirou Kuromitsu
• Central Research Institute, Mitsubishi Materials Corporation
• Society for Information Display (SID) 03 DIGEST, 23.3(2003)

3. Effect of the Electron Injection Layer on the Organic EL/Si Emission Layer

• Yutaka Mitsutomi, Hideaki Takahashi, Yoshitaka Iwasaki, Masahiko Hasumi, Tomoo Ueno, Koichi Kuroiwa, Nobuyoshi Miyabayashi*
• Tokyo Univ. of Agriculture and Technology, *Electron Science Ltd.
• The 64th Applied Physics Society Meeting (Fall 2003): 31p-YL-11

4. Reduction of Ashing Damage in CVD-SiOC Films Using H₂O Ashing

• Michinari Yamanaka, Hiroshi Yuasa, Toshihiro Otsuka, Shigenori Sakamori*
• Matsushita Electric Industrial Co., Ltd., Conductor Division, Process Development Center, *Renesas Technology Corporation, Production Engineering Division, Wafer Process Technology Department
• The 64th Applied Physics Society Academic Conference (Fall 2003): 31a-ZK-8, p.669

5. Prevention of Water Adsorption in Interlayer Insulation Films via Nitrogen Plasma Treatment

• Toshihiro Otsuka, Chie Kudouchi, Sadayuki Imanishi
• Matsushita Electric Industrial Co., Ltd. Semiconductor Division Process Development Center
• The 64th Applied Physics Society Academic Conference (Fall 2003): 2p-YC-1, p.706

6.Material Properties and Process Compatibility of Spin-on Nano-foamed Polybenzoxazole for Copper Damascene Process

• Takashi Enoki, Kenzo Maejima, Hidenori Saito, Akifumi Katsumura
• Fundamental Research Laboratory, Research Department, Sumitomo Bakelite Co., Ltd.
• Mater. Res. Soc. Symp. Proc. Vol.740, 2003 Materials Research Society, I12.9.1

2002: Papers, Journals, Books

1.Force Driving Cu Diffusion into Interlayer Dielectrics

• Takuya Fukuda, Hirotaka Nishino, Azuma Matsuura and Nironori Matsunaga
• Association of Super-Advanced Electronics Technolugies
• Jpn.J.Appl.Phys.,41,537(2002)

2.Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminium Wiring and Polysilicon Gate

• Shuichi Saito*1*2, Kazuyuki Sugita*1, Jyunichi Tonotani*2 and Masashi Yamage*2
• *1 Graduate School of Science and Technology, Chiba University, *2 Corporate Manufacturing Engineering Center, Toshiba Corporation
• Jpn.J.Appl.Phys.,41,2220(2002)

3.Evolution of water vapor from indium-tin-oxide thin films fabricated by various deposition processes

• S.Seki*1, T.Aoyama*1, Y.Sawada*1, M.Ogawa*1, M.Sano*2, N.Miyabayashi*2, H.Yoshida*3, Y.Hoshi*1, M.Ide*4 and A.Shida*4
• *1 Graduate School of Engineering, Tokyo Institute of Polytechnics, *2 ESCO Ltd., *3 Geomatec Co., Ltd., *4 Yokohama City Center for Industrial Technology and Design
• J.Therm.Anal.Cal.,69,1021(2002)

4. Evaluation of Transparent Conductive Films Using Thermal Desorption Analysis

• Yutaka Sawada, Shigeyuki Seki, Tsuyoshi Aoyama, Makiko Sano*, Nobuyoshi Miyabayashi*
• Tokyo Polytechnic University, *Department of Electronic Science
• New Developments in Transparent Conductive Films, Chapter 15, 175 (CMC Publishing)

5. Demonstration of High Reliability for Ultra-Thin Gate Oxides Using Deuterium and Elucidation of the Mechanism for Reliability Improvement

• Yuichiro Mitani, Hideki Satake
• Toshiba Corporation, Research and Development Center
• Toshiba Review, 57 (11),34(2002)

6. Evaluation of the Heat Treatment Process for Blue-Emitting BaAl₂S₄:Eu Thin Films

• Shinichi Nagano, Mitsuhiro Kawanishi, Noboru Miura, Akihiro Matsumoto, Ryotaro Nakano
• Department of Electronic and Communication Engineering, Faculty of Science and Technology, Meiji University
• IEICE Technical Report, EID2001-90, 49(2002)

7. Quantitative Dynamic Evaluation of Temperature-Induced Desorption of Titanium Oxide Films Using Hydrogen Gas

• Yasuhiro Yamauchi, Yoshiyuki Mizuno**, Akihiro Tanaka*, Teiichi Honma
• Chiba Institute of Technology, *ULVAC-FAI, Inc., **Stanford Linear Accelerator Center, Stanford University
• Vacuum, 45(3), 265 (2002)

8. Degassing Characteristics of MgO for Plasma Display Panels

• Yasuhiro Ueda, Hiroshi Kurokawa
• Mitsubishi Electric Corporation, Advanced Technology Research Laboratories
• Vacuum, 45(2), 97 (2002)

9. Surface Science - The Physics of Chemical Reactions -

• Yoshimasa Murata
• Professor Emeritus, The University of Tokyo
• Iwanami Lectures: The World of Physics (Iwanami Shoten)

2002: Key Points of the Society

1. Analysis of the Calcination Process for Titania Gel Films Using Thermal Desorption

• Takayuki Yabe, Toshikazu Nishide, *Nobuyoshi Miyabayashi, *Makiko Sano
• Nihon Univ. (Eng.), *Electron Science
• Proceedings of the 2002 Annual Meeting of the Ceramic Society of Japan (March 2002): 2I21

^2.18O-containing titania gel membrane calcination process via sol-gel method

• Toshikazu Nishide, Takayuki Yabe, *Nobuyoshi Miyabayashi, *Makiko Sano
• Nihon Univ. (Eng.), *Electronics Science
• Proceedings of the 2002 Annual Meeting of the Ceramic Society of Japan (March 2002): 2I22

3. Effect of Precipitation Phases on Hydrogen Diffusion Behavior in Copper Alloys

• Hideaki Tomita, Shigeru Kuramoto*, Mikihiro Sugano**
• The University of Tokyo, *Toyota Central R&D Labs, **The University of Tokyo
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2002); (1384)

4. Research on Thin-Film Gas Sensors Using Thermal Desorption Gas Analysis

• Osamu Takahashi, Kazuhiro Hara
• Tokyo Denki University
• Proceedings of the 63rd Annual Meeting of the Japan Society of Applied Physics (Fall 2002): 24p-K-2

5. Evaluation of the Alq3 Molecular Deposition Process Using TDS: Effects of Alq3 Purification

• Atsushi Hirai, Yutaka Mitsutomi, Yoshitaka Iwasaki, Masahiko Hasumi, Tomoo Ueno, Koichi Kuroiwa, *Makiko Sano, *Nobuyoshi Miyabayashi
• Tokyo University of Agriculture and Technology, *Department of Electronic Science
• Proceedings of the 63rd Applied Physics Society Academic Conference (Fall 2002): 26p-ZH-1

6. Blue-emitting BaAl₂S₄:Eu EL element water quantitative analysis

• Shinichi Nagano, Noboru Miura, Akihiro Matsumoto, Ryotaro Nakano
• Faculty of Science and Technology, Meiji University
• Proceedings of the 63rd Applied Physics Society Conference (Fall 2002): 26p-ZD-14

2001: Papers, Journals, Books

1. Influences of Residual Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Reliability in Multiple-Thickness Oxide Technology

• Masaru Moriwaki, Takayuki Yamada
• ULSI Process Technology Development Center, Matsushita Electronics Corporation
• Jpn. J. Appl. Phys., 40,2679(2001)

2.Recovery of useful hydrocarbons from oil palm waste using ZrO2 supporting FeOOH catalyst

• T.Masuda, Y.Kondo, M.Miwa, T.Shimotori, S.R.Mukai, K.Hashimoto, M.Takano*, S.Kawasaki*, S.Yoshida**
• Graduate School of Engineering, Kyoto University, Institute for Chemical Research, Kyoto University*, NGK Insulators LTD.**
• Chemical Engineering Science, 56, 897 (2001)

3. Mechanism for Low-Temperature Activation of Mg-Doped GaN with Ni Catalysts

• (1)I.Waki, H.Fujioka, M.Oshima, (2)H.Miki, and M.Okuyama
• (1)Department of Applied Chemistry, The University of Tokyo, (2)Chichibu Research Laboratory, Central Research Laboratory, Showa Denko KK
• J. Appl. Phys., 90(12), 6500 (2001)

4. Study on Temperature Calibration of a Silicon Substrate in a Temperature Programmed Desorption Analysis

• N. Hirashita, T. Jimbo, T. Matsunaga, M. Matsuura, M. Morita, I. Nishiyama, M. Nishizuka, H. Okumura, A. Shimazaki, and N. Yabumoto
• Working Group of Equipment, Ultraclean Standardization Committee, Ultraclean Society
• J. Vac. Sci. Technol. A, 19, 1255 (2001)

2001: Key Points of the Society

1. Evaluation of Materials Using Thermal Desorption Analysis

• Nobuyoshi Miyabayashi
• Electronic Science
• 2001 Kanagawa Prefecture Industry-Academia-Government Exchange Research Presentation (2001.10.19)

2. Surface Analysis and TDS

• Makiko Sano
• Electronic Science
• 4th Practical Surface Analysis Seminar (November 9, 2001)

3. Analysis of the Calcination Process for Titania Gel Films Prepared by the Sol-Gel Method Using a Temperature-Rising Desorption Technique

• Takayuki Yabe, Toshikazu Nishide, ＊Nobuyoshi Miyabayashi, ＊Makiko Sano
• Nihon University, College of Engineering, ＊Electronic Science
• Proceedings of the 14th Autumn Symposium of the Ceramic Society of Japan: 2B04

4. Synthesis and Evaluation of Inorganic-Organic Hybrids Exhibiting Selective Gas Adsorption Properties

• Noriko Yamada, Yuji Kubo, Shingo Katayama
• Advanced Technology Research Institute, Nippon Steel Corporation
• Proceedings of the 14th Autumn Symposium of the Ceramic Society of Japan: 3B07

5. Environmental Embrittlement of Vitreous Silica Fibers

• Ken-ichi Takai, Takeshi Noda, Daisaku Yamada, Noriyuki Hisamori and Akira Nozue
• Department of Mechanical Engineering, Sophia University
• The Japan Society of Materials Science 50th Anniversary International Symposium (May 2001)

6. Environmental embrittlement of Al₂O₃ and ZrO₂ and analysis of the presence state of water and hydrogen

• Kazuhiko Noguchi, Ken-ichi Takai, Noriyuki Hisamori, Akira Nozue
• Sophia University, Faculty of Science and Technology
• The 129th Autumn Meeting of the Japan Institute of Metals, No.100.

7. Environmental Embrittlement of Quartz Glass Fiber and Analysis of Water and Hydrogen Presence Conditions

• Daisaku Yamada, Kenichi Takai, Akira Nozue
• Sophia University, Faculty of Science and Technology
• The 129th Autumn Meeting of the Japan Institute of Metals, No. 99.

8. Investigation of the Calcination Process of Hafnium Thin Films Prepared by the Sol-Gel Method Using Thermal Desorption

• Kinya Adachi, Toshikazu Nishide, *Nobuyoshi Miyabayashi, *Makiko Sano
• Nihon University College of Engineering, *Department of Electronic Science
• Proceedings of the 2001 Annual Meeting of the Ceramic Society of Japan (March 2001): 2K26

9.18 Firing Process of Hafnium Thin Films Prepared by Sol-Gel Method Containing O

• Toshikazu Nishide, Kinya Adachi, *Nobuyoshi Miyabayashi, *Makiko Sano
• Faculty of Engineering, Nihon University, *Electronic Science
• Proceedings of the 2001 Annual Meeting of the Ceramic Society of Japan (March 2001): 2K27

10. Investigation of ITO Transparent Conductive Films Using Thermal Desorption Analysis

• Nobuyuki Seki, Yutaka Sawada, *Nobuyoshi Miyabayashi, *Makiko Sano, **Mieko Ide
• Tokyo Polytechnic University, *Electronic Science, **Yokohama City Technical Support Center
• Proceedings of the 2001 Annual Meeting of the Ceramic Society of Japan (March 2001): 2K28

11. Oxygen Behavior of Silicon Nitride Powder (II)

• Yoshihisa Beppu, Motohide Ando, Tatsuki Oji*
• Synergy Research Institute, *National Institute for Materials Science
• Proceedings of the 2001 Annual Meeting of the Ceramic Society of Japan (March 2001): 2A34

12. Analysis of the Existence States of Water and Hydrogen in Al₂O₃ and ZrO₂ by Temperature-Programmed Desorption

• Kazuhiko Noguchi, Masato Ota, Kenichi Takai, Noriyuki Hisamori, Akira Nozue
• Sophia University, Faculty of Science and Technology
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (1002)

13. Effects of H₂O and H₂ on Environmental Embrittlement of Quartz Glass Fiber

• Daisaku Yamada, Takeshi Noda, Kenichi Takai, Akira Nozue
• Sophia University, Faculty of Science and Technology
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (1071)

14. Hydrogen Diffusion Rate and In-Vivo Embrittlement of Ni-Ti Alloys

• Kenzo Asaoka, Kenichi Yokoyama
• Tokushima University, Dentistry
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (126)

15. Effect of Fe Content on Hydrogen Desorption Spectra in Pd-Fe Alloys

• Hiroshi Yamashita, * Shuji Harada
• Graduate Student, Niigata University; *Faculty of Engineering, Niigata University
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (194)

16. Hydrogen-Induced Amorphization of BCC-Type Ti-Al-Zr Alloys

• Keisho Miyajima, *Kazuhiro Ishikawa, *Kiyoshi Aoki
• Kitami Institute of Technology, *Kitami Institute of Technology Faculty of Engineering
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (211)

17. Dehydrogenation Process of Nanostructured Graphite-Hydrogen Systems

• Tomoyoshi Matsushima, Shinichi Orimo, Hironobu Fujii
• Hiroshima University, Graduate School of Science and Engineering
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (212)

18. Hydrogen Storage Properties of Ti₃Al-Based Alloys (Effect of Stoichiometric Deviation)

• Yusuke Kojima, Munenori Watanabe, *Kazuhide Tanaka
• Nagoya Institute of Technology (Graduate School), *Nagoya Institute of Technology, Faculty of Engineering
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (214)

19. Hydrogen Storage and Desorption Properties of Binary Ti-Al Alloys

• Kunihiko Hashi, *Kazuhiro Ishikawa, **Seisaku Suzuki, *Kiyoshi Aoki
• Kitami Institute of Technology Graduate School, *Kitami Institute of Technology Faculty of Engineering, **University of New South Wales,
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (215)

20. Transfer Introduction of LaNi5 and Protium Trapping

• Yamamoto, Atsushiro; *Inui, Haruyuki; *Yamaguchi, Masaharu
• Kyoto Univ. (Eng.), *Kyoto Univ. (Eng.)
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (218)

21. Effect of Lattice Defects on Residual Hydrogen in LaNi5

• Koji Sakaki, *Hiroyuki Takeshita, *Nobuhiro Kuriyama, **Yukio Murakami, **Hiroshi Mizubayashi, ***Hideki Araki, ***Yasuji Shirai
• Osaka Univ., Grad. Sch., *National Institute for Materials Science, **Univ. of Tsukuba, *** Osaka Univ. (Eng.)
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (219)

22. Comparison of Hydrogen Uptake and Desorption Properties of Ti-Zr-Ni Quasicrystals and Amorphous Powders Prepared by Mechanical Alloying

• Akihito Takasaki, *Chang-Ho Han,**Yoshio Furuya
• Shibaura Institute of Technology, Faculty of Engineering, *Shibaura Institute of Technology (Graduate School), **Nagasaki University, Faculty of Education
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (222)

23. Hydrogen Storage in (Mg, Yb)Ni₂ Alloys

• Hideki Otsu, Kazuyuki Kanda, *Kazuhiro Ishikawa, *Kiyoshi Aoki
• Kitami Institute of Technology Graduate School, *Kitami Institute of Technology Faculty of Engineering
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (230)

24. High-capacity nano-composite Mg thin film capable of adsorption and desorption at low temperatures

• Koichi Higuchi, Hide Kajioka, Kiyokazu Majima, Masahide Honda, *Kenichi Yamamoto, **Shinichi Orimo, Hironobu Fujii
• Western Hiroshima Prefecture Industrial Technology Center, *Mazda Motor Corporation, **Hiroshima University Graduate School of Engineering Science
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (231)

25. Grain Refining and Mechanical Properties of 5083 Al Alloy via Hydrogen Absorption Treatment

• Kunio Funami, *Ryusei Sano
• Chiba Institute of Technology, Faculty of Engineering, *Graduate Student, Chiba Institute of Technology
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (256)

26. Increase in Hardness of SUS304 Stainless Steel Associated with Cathodic Hydrogen Absorption

• Hideki Hagi
• Fukui University of Technology
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (264)

27. Helium and Deuterium Storage Properties of Ferrite Steel

• Yasuyuki Takao, *Hirotomo Iwakiri, *Naoaki Yoshida
• Kyushu Univ. Graduate School, *Kyushu Univ. Institute for Materials Research
• Abstracts of the Spring Meeting of the Japan Institute of Metals (2001); (64)

28. Microstructure and Protium Uptake/Desorption Properties of Mg₂Ni/LaNi₅ Composite Materials

• Hayato Okumura, Akihiro Matsui, Shintaro Yamagiwa, Shigeharu Kamado, Yo Kojima
• Nagaoka University of Technology (Faculty of Engineering)
• Abstract of Presentation at the Spring Meeting of the Japan Institute of Metals (2001); (928)

29. ELECTRICAL AND STRUCTURAL PROPERTIES OF CATALYTIC-NITRIDED SiO₂ FILMS

• Akira Izumi, Hidekazu Sato, and Hideki Matsumura
• JAIST (Japan Advanced Institute of Science and Technology)
• Materials Research Society Symposium Proceedings, Vol. 670, pp. K7.8.1-K7.8.6, 2001

30. Mechanism of Low-Temperature Activation of Mg-Doped GaN Using Ni Catalysts

• Kazutaro Waki, Hiroshi Fujioka, Masaharu Ojima, *Hisayuki Miki, *Mineo Okuyama　
• The University of Tokyo, *Showa Denko K.K.　　
• Proceedings of the 62nd Annual Meeting of the Japan Society of Applied Physics (Fall 2001): 11p-Q-2

31. Low-Temperature Activation of Mg-Doped GaN Using a Transition Metal Catalyst Layer

• Kazutaro Waki, Hiroshi Fujioka, Masaharu Ojima, *Hisao Miki, *Mineo Okuyama　
• The University of Tokyo, *Showa Denko K.K.　　
• Proceedings of the 62nd Applied Physics Society Conference (Fall 2001): 11p-Q-3

32. Delamination of Si after H⁺ Ion Implantation (ESR Evaluation)

• Shiho Sasaki, Tomio Izumi, ＊Toru Hara
• Tokai University, Engineering, ＊Hosei University, Engineering　
• Proceedings of the 62nd Applied Physics Society Academic Conference (Fall 2001): 12a-V-7

33. TDS Analysis of Gases Released from Carbon Nanotubes

• Makoto Okai, Yasuhiko Munekichi, Tomio Yaguchi, Nobuaki Hayashi
• Hitachi Display Group
• Proceedings of the 62nd Applied Physics Society Conference (Fall 2001): 12a-ZT-4

34. Film Quality Control in Radical Shower-CVD

• Akira Kumagai, Keiji Ishibashi, Hong Zhang, Masahiko Tanaka, Naotake Kitano, Ge Xu, Naoaki Yokokawa, Manabu Ikemoto
• Anelva
• Proceedings of the 62nd Applied Physics Society Academic Conference (Fall 2001): 13a-C-7

35. Deposition Method Dependence of Epitaxial Growth SrRuO₃ Thin Film Properties

• Kenji Takahashi, Takahiro Oikawa, *Keisuke Saito, Hiroshi Funakubo
• Tokyo Tech, *Philips Japan
• Proceedings of the 62nd Applied Physics Society Conference (Fall 2001): 13a-ZR-8

36. Analysis of the Thermal Treatment Process of Blue-Emitting BaAl₂S₄:Eu Thin Films Using Thermal Desorption Gas Spectroscopy

• Shinichi Nagano, Noboru Miura, Hirohisa Matsumoto, Ryotaro Nakano
• Meiji University　
• Proceedings of the 62nd Applied Physics Society Academic Conference (Fall 2001): 14a-P14-12

37. Analysis of Chlorine Desorption Process in TiN Thin Film Synthesis Using Flow Modulation CVD

• Yukihiro Shimogaki, Hirotaka Hamamura
• The University of Tokyo, Faculty of Engineering
• Proceedings of the 62nd Applied Physics Society Academic Conference (Fall 2001): 14a-X-3

38. Evaluation of the Alq3 Molecular Deposition Process Using TDS and Its Applications

• *Atsushi Hirai, *Yoshitaka Iwasaki, *Masahiko Aimi, *, **Tomoo Ueno, *Koichi Kuroiwa, ***Makiko Sano, ***Nobuyoshi Miyabayashi
• *Tokyo Univ. of Agriculture and Technology, Faculty of Engineering, **Current, New Energy and Industrial Technology Development Organization (NEDO), ***Electronics Science
• Proceedings of the 48th Applied Physics Related Joint Conference (March 2001, Meiji University); 29p-ZN-12

39. Delamination of H+ Ion-Implanted Silicon Through SiO2 Thin Films (ESR Evaluation)

• Sasaki, Shiho; Izumi, Tomio; *Hara, Toru
• Tokai Univ. (Eng.), *Hosei Univ. (Eng.)
• Proceedings of the 48th Applied Physics Related Joint Conference (March 2001, Meiji Univ.); 30a-P11-7

40. Operational Analysis of Environmental Sensors Using Thermal Desorption Analysis

• Tatsuya Yokoyama, Kazuhiro Hara
• Tokyo Denki University
• Proceedings of the 48th Applied Physics Related Joint Conference (March 2001, Meiji University); 30p-ZR-10

41. Low-Temperature Activation of Mg-Doped GaN (1) - Effect of Heat Treatment in O₃ and N₂O -

• Kazutaro Waki, Hiroshi Fujioka, Masaharu Ojima, *Hisayuki Miki, *Akira Fukizawa
• Graduate School of Engineering, The University of Tokyo, *Showa Denko K.K., Chichibu Research Laboratory
• Proceedings of the 48th Joint Conference on Applied Physics (March 2001, Meiji University); 31p-K-2

42. Hydrogen Bonding States and Film Quality Evaluation of α-Ge:H Films During Vacuum Heating (III)

• Katsuto Iseki, Shinichi Kobayashi, Takeshi Aoki
• Graduate School of Tokyo Polytechnic University, Collaborative Advanced Technology Research Center
• Proceedings of the 48th Applied Physics Related Joint Conference (March 2001, Meiji University); 28a-ZL-8

43. Dynamic Evaluation of Temperature-Induced Desorption of Titanium Oxide Films Using Hydrogen Gas

• Yasuhiro Yamauchi, Yoshiyuki Mizuno, *Akihiro Tanaka, Teiichi Honma
• Chiba Institute of Technology, *ULVAC-Fai Co., Ltd.
• Proceedings of the 48th Applied Physics Related Joint Conference (March 2001, Meiji University); 29p-ZF-6

44. Tritium gas release from quartz glass

• Shoichi Nasu, Masashi Fumi, *Takaaki Tanifuji, *Shiro Mikawa
• Kanazawa Institute of Technology, *Japan Atomic Energy Research Institute
• Proceedings of the 48th Applied Physics Related Union Conference (March 2001, Meiji University); 29p-ZL-11

45. Development of a Cryogenic Reaction System for Semiconductor Thin Film Formation Using Solid-State Tunnel Reactions of Hydrogen Atoms (II)

• Tetsuya Sato, Katsunori Suzuki, Yukinori Takahashi, Shigeomi Hishiki, Shigemitsu Okazaki, Kiyokazu Nakagawa, Kenzo Hiraoka, *Shoshi Sato, *Chiji Miyata, **Toshiyuki Takamatsu
• Faculty of Engineering, University of Yamanashi, *Miyatsu Communications Co., Ltd., **SST
• Proceedings of the 48th Joint Conference on Applied Physics (March 2001, Meiji University) ; 30a-ZT-7

2000: Papers, Journals, Books

1. Comparative Study of Hydride Organo Siloxane Polymer and Hydrogen Silsesquioxane

• Sung-Woong Chung, Sub-Young Kim, Joo-Han Shin, Jun Ki Kim, and Jinwon Park
• Memory R&D Division, Hyundai Electronics Ind. Co., Ltd.
• Jpn. J. Appl. Phys., 39, 5909 (2000)

2. Evaluation of Molecular Contamination and Its Impact on Devices Using Thermal Desorption Analysis

• Norio Hirakita
• OKI Electric Industry Co., Ltd., Ultra-LSI R&D Center
• Realize Inc., Semiconductor Clean Technology Series Basic Course [UCT-10]

3. Effects of Isothermal Transformation Temperature and Wire Drawing on Hydrogen Absorption Properties of Alloy Steel

• Kenichi Takai, Akira Nozue
• Department of Mechanical Engineering, Faculty of Science and Technology, Sophia University
• Journal of the Japan Institute of Metals, 64, 669 (2000)

4. Ta₂O₅ Capacitor Formation Technology for DRAM

• Satoshi Kamiyama
• NEC Corporation, Fundamental Research Division, System Devices
• Applied Physics, 69, 1067 (2000)

5. Oxygen Partial Pressure During Deposition and Gas Adsorption Characteristics of MgO Films for Plasma Display Panels

• Takao Sawada, Keiji Watanabe*, Keiji Fukuyama, Takuya Ohira, Masaru Kinugawa, Ko Sano**
• Mitsubishi Electric Corporation, Advanced Technology Research Laboratories, * Everem Co., Ltd., **Mitsubishi Electric Corporation, Display Device Division
• Vacuum, 43(10), 973 (2000)

6. Characterization of Low-Dielectric-Constant Methylsiloxane Spin-on-Glass Films

• Noriko Yamada and Toru Takahashi
• Advanced Technology Research Laboratories, Nippon Steel Corporation
• Jpn. J. Appl. Phys. 39 (2000) pp. 1070-1073

2000: Key Points of the Society

1. Phase transitions upon heating of AlOOH with different crystalline structures

• Toru Nagashima, Kinichi Kameshima, Atsuo Yasumori, Kiyoshi Okada, *Makiko Sano
• Tokyo Institute of Technology, Graduate School of Science and Engineering, *Electronics Science
• Proceedings of the 13th Autumn Symposium of the Ceramic Society of Japan

2. Solid-State NMR Analysis of Silicon Oxide and Its Structural Characterization

• Mikio Aramata, Hirofumi Fukuoka, Kazutoshi Fujioka
• Shin-Etsu Chemical Co., Ltd., Gunma Plant
• The 61st Symposium on Analytical Chemistry (May 18, 2000, Nagaoka Lyric Hall): Session 2H14

3. Hydrogen distributions near the SiO2-Si interface

• Y. Kawashima, Z. Liu, H. Kawano, and M. Kudo*
• Analysis Technology Development Division, NEC Corporation, *Faculty of Engineering, Seiseki University
• The Proceedings of the Second International Symposium on SIMS and Related Techniques (November 2000)

4. Study on the Calcination Process of HfO₂ Thin Films Using the Temperature-Rising Desorption Method

• Kinya Adachi, Toshikazu Nishide, Nobuyoshi Miyabayashi*, Makiko Sano*
• Nihon Univ. (Eng.), Electronic Science*
• Japan Ceramic Society Tohoku-Hokkaido Branch Research Presentation Meeting, 20th Basic Science Division Tohoku-Hokkaido Regional Symposium (Fall 2000): 1P19

5. Analysis of HfO₂ Films by Temperature-Programmed Desorption

• Makiko Sano, Nobuyoshi Miyabayashi, Kinya Adachi*, Toshikazu Nishide*,
• Electronic Science, *Nihon Univ. (Eng.)
• 4th Practical Surface Analysis Symposium (2000.12.8): P1-10

6. Effects of H₂O and H₂ on Environmental Embrittlement of Quartz Glass Fiber

• Takeshi Noda, Daisaku Yamada, Kenichi Takai, Akira Nozue
• Sophia University, Faculty of Science and Technology
• Abstracts of the Autumn Meeting of the Japan Institute of Metals (2000) p509

7. Effects of Water and Hydrogen on Environmental Embrittlement of Quartz Glass Fiber

• Kenichi Takai, Takeshi Noda, Akira Nosue
• Sophia University, Faculty of Science and Technology
• (The Iron and Steel Institute of Japan) Materials Structure and Properties Division, Science and Technology Promotion Coordination Fund Comprehensive Research, 5th Results Report Symposium Abstracts p7 (Fall 2000)

8. Effects of H₂O and H₂ on Environmental Embrittlement of Quartz Glass Fiber

• Kenichi Takai, Takeshi Noda, Shinji Kawamura, Akira Nozue
• Sophia University, Faculty of Science and Technology
• Proceedings of the 1st Micromaterials Symposium p43 (Fall 2000)

9. Changes in the Properties of Low-Dielectric-Constant Porous Films Induced by ICP Oxygen Plasma Irradiation

• Atsushi Fujinai, Hiroki Arao, Miki Egami, Akira Nakajima, Eiichi Kondo*, Tanehisa Asano*
• Catalyst Chemical Industry Co., Ltd. Fine Research Institute, Kyushu Institute of Technology Microfabrication Technology Center*
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4a-P4-18

10. Calibration Method for Silicon Substrate Temperature in Thermal Desorption Analysis 1 UC Standard Specification

• Norio Hirasita (Oki Electric), Shuho Yabu (NTT-AT), Haruki Okumura (Toray Research Center), Ayako Shimazaki (Toshiba), Tomoko Jimbo (Hitachi), Masaru Nishizuka (Toshiba Microelectronics), Iwao Nishiyama (NEC), Masazumi Matsuura (Mitsubishi Electric), Toshiyuki Matsunaga (Matsushita Techno Research), Mizuho Morita (Osaka Univ.)
• UCS Semiconductor Substrate Technology Research Group Standardization Committee Equipment Subcommittee
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4p-ZC-10

11. Calibration Method for Silicon Substrate Temperature in Thermal Desorption Analysis 2 UC Standard Specification

• Norio Hirasita (Oki Electric), Shuho Yabu (NTT-AT), Haruki Okumura (Toray Research Center), Ayako Shimazaki (Toshiba), Tomoko Jimbo (Hitachi), Masaru Nishizuka (Toshiba Microelectronics), Iwao Nishiyama (NEC), Masazumi Matsuura (Mitsubishi Electric), Toshiyuki Matsunaga (Panasonic Techno Research), Mizuho Morita (Osaka Univ.)
• UCS Semiconductor Fundamental Technology Research Group Standardization Committee Equipment Subcommittee
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4p-ZC-11

12. Calibration Method for Silicon Substrate Temperature in Thermal Desorption Analysis 3 UC Standard Specification

• Norio Hirasita (Oki Electric), Shuho Yabu (NTT-AT), Haruki Okumura (Toray Research Center), Ayako Shimazaki (Toshiba), Tomoko Jimbo (Hitachi), Masaru Nishizuka (Toshiba Microelectronics), Iwao Nishiyama (NEC), Masazumi Matsuura (Mitsubishi Electric), Toshiyuki Matsunaga (Panasonic Techno Research), Mizuho Morita (Osaka Univ.)
• UCS Semiconductor Fundamental Technology Research Group Standardization Committee Equipment Subcommittee
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4p-ZC-12

13. Calibration Method for Silicon Substrate Temperature in Thermal Desorption Analysis 4 UC Standard Specification

• Norio Hirage (Oki Electric), Shuho Yabu (NTT-AT), Haruki Okumura (Toray Research Center), Ayako Shimazaki (Toshiba), Tomoko Jimbo (Hitachi), Masaru Nishizuka (Toshiba Microelectronics), Iwao Nishiyama (NEC), Masazumi Matsuura (Mitsubishi Electric), Toshiyuki Matsunaga (Panasonic Technol Research), Mizuho Morita (Osaka Univ.)
• UCS Semiconductor Fundamental Technology Research Group Standardization Committee Equipment Subcommittee
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4p-ZC-13

14. Analysis of Surface Reaction Layers in High Selectivity Ratio Oxide Film Etching

• Nobuo Ozawa, Tetsuya Tatsumi, Kenji Ishikawa, Kazuaki Kurihara, Makoto Sekine
• ASET Plasma Research Institute
• Proceedings of the 61st Joint Conference on Applied Physics (Fall 2000): 6a-ZF-8

15. Annealing Characteristics of Silicon with High-Concentration H⁺ Ion Implantation Through Thin SiO₂ Films

• Shiho Sasaki, Hiroaki Ujikawa, Ershad Ali Chowdhury, Tomio Izumi, Toru Hara*
• Tokai Univ. (Eng.), Hosei Univ. (Eng.)*
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 6p-ZD-17

16. Etching Characteristics of W Polyside Film

• Hiroyuki Fukunaga, Miki Nagatomo, Shuichi Saito
• Toshiba Corporation, Production Technology Center
• Proceedings of the 61st Applied Physics Joint Conference (Fall 2000): 7a-W-8

17. Adsorption and Desorption Behavior of Organic Materials on Wafer Surfaces 2

• Yoshimi Shiramizu, Toshikazu Takada, Kaori Komada*
• NEC Corporation, NEC Software, Ltd.*
• Proceedings of the 61st Applied Physics Joint Conference (Fall 2000): 3p-ZC-7

18. Deposition of Low-Dielectric-Constant Films Using Plasma CVD with HMDSO (1) - Using N2O as the Oxidant -

• Yoichi Yamamoto, Hiroshi Inokura, Tomomi Ishimaru, Yuichiro Kotake, Shoji Okawara, Kimi Shiotani*, Koichi Ohira*, Kazuo Maeda*
• Canon Sales Co., Ltd., Semiconductor Process Research Institute, Inc.*
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 4a-P4-21

19. Cryogenic Formation of Gate Nitride Films Using NH₃/SiF₄-Based α-SiNx:F (II)

• Hiroyuki Ota, Masaru Hori, Toshio Goto
• Faculty of Engineering, Nagoya University
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 5a-ZD-4

20. TDS and UPS of cesium oxide on Si (100)2×1

• Akihiko Ishi, Takashi Fujii, Seiya Toyoshima, Toshio Urano, Shozo Hongo
• Faculty of Engineering, Kobe University
• Proceedings of the 61st Applied Physics Joint Academic Conference (Fall 2000): 6a-S-1

21. Adsorption of Alcohol Fluoride onto HfO₂ Thin Films by the Sol-Gel Method

• Kanaya Adachi, Toshikazu Nishide, Osamu Watanabe*, Tsugiko Takase*, Nobuyoshi Miyabayashi**
• Faculty of Engineering, Nihon University, Fukushima Prefecture High-Tech Plaza*, Electronic Science Co., Ltd.**
• Proceedings of the 47th Applied Physics Joint Conference (Spring 2000): 29a-ZG-3

22. Temperature Dependence of Capacitance in Damascene Interconnect Structures Using Low-Dielectric-Constant Insulation Films

• Towa, Noriaki Matsunaga, Chinpei Nakata, Hideki Shibata
• Microelectronics Technology Laboratory, Toshiba Semiconductor Corporation
• Proceedings of the 47th Joint Conference on Applied Physics (Spring 2000): 29p-YA-11

23. Effects of Various Wet Process Treatments on Organic Polymer-Based Low-Dielectric-Constant Insulation Films (PAE)

• Yoshiyuki Kitazawa, Shingo Tomohisa, Yasutaka Nishioka, Naoki Yasuda, Seishi Muranaka*, Kinya Goto*, Masazumi Matsuura*, Yoshihiko Toyoda, Tatsuo Omori
• Mitsubishi Electric Advanced Technology Research Laboratories, ULSI Technology Development Center*
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29p-YA-16

24. Reduction of Dielectric Constant in BCB Films via Plasma Polymerization

• Munehiro Tada, Jun Kawahara, Yoshihiro Hayashi
• NEC Silicon Systems Laboratories
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29p-YA-8

25. Investigation of Correlation between Structures and Adsorption States of Alkanethiol Self-Assembled Monolayers on Au(111)

• J. Noh, T. Araki*, K. Nakajima, and M. Hara
• FRS RIKEN, Saitama Univ.*
• Proceedings of the 47th Applied Physics Related Union Meeting (Spring 2000): 29p-YA-8

26. Study on the Adsorption and Desorption Processes of Self-Assembled Monolayers of Fluorinated Alkanethiols

• Akihiro Suzuki1, Yuriko Okude1, Fumio Nakamura2, Masahiko Hara12, Kaoru Tamada3, Hitoshi Fukushima4, T.R. Lee5
• Tokyo Tech 1, RIKEN 2, NIMS 3, Seiko Epson 4, University of Houston 5
• Proceedings of the 47th Applied Physics Conference (Spring 2000): 29p-YA-8

27. Analysis of Moisture and Organic Matter Adsorption States on Si Wafer Surfaces

• Toshihiro Morimoto, Kenichi Kamimura
• Advanced Technology Research Laboratories, Nippon Steel Corporation
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 28p-YH-7

28. Plasma reactivity of functional groups in low-dielectric-constant spin-on glasses

• Eiichi Kondo, Toshiya Yumi, Tanemasa Asano, Hiroki Arao*, Akira Nakajima*
• Kyushu Institute of Technology Microfabrication Technology Center, Catalyst Chemical Industry Co., Ltd., Fine Research Institute*
• Proceedings of the 47th Joint Conference on Applied Physics (Spring 2000): 29a-YA-10

29. Gas Release Characteristics of Titanium Surfaces Following Surface Polishing

• Takahiro Okada, Akihiro Tanaka, Yoshiyuki Mizuno, Teiichi Honma
• Chiba Institute of Technology, ULVAC-Fai Co., Ltd.*, Nippon Valqua Industries, Ltd.**
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29a-ZG-1

30. Excess nitrogen released from the TiN layer during annealing of Ta₂O₅/TiN_x/Si (x 1)

• N. Yasuda*,***, H.C. Lu*, E. Garfunnkel*, T. Gustafsson*, J.P. Chang**, G. Alers**
• Rutgers University*, Lucent Technologies**, On leave from Toshida Corporation***
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29a-ZG-3

31. Quantitative Analysis of Hydrogen in Amorphous Silicon Films by Thermal Desorption

• Sakae Inayoshi, Kazuya Saito, Masanori Hashimoto*, Shin Asari*
• Japan Vacuum Technology Co., Ltd., Tsukuba Advanced Materials Research Center, Chiba Advanced Materials Research Center*
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29p-ZH-1

32. Hydrogen Bonding State and Film Quality Evaluation of α-Ge:H Films During Vacuum Heating

• Katsuto Iseki, Shinichi Kobayashi, Takeshi Aoki
• Graduate School of Tokyo Polytechnic University, Collaborative Advanced Technology Research Center
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29p-ZH-6

33. Film Structure and Surface Observation of a-SiC:H Prepared by Glow Discharge Method (II)

• Mitsuyoshi Motohashi, Kumi Soe, Kazuaki Honma
• Tokyo Denki University, Faculty of Engineering
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 29p-ZH-9

34. Formation of dangling bond wire chains via selective hydrogen desorption on hydrogen-terminated Si(111) surfaces

• Kosuke Inoue, Hiroyuki Sakagami, Shozo Shingu, Takayuki Takahagi
• Faculty of Engineering, Hiroshima University
• Proceedings of the 47th Applied Physics Related Joint Conference (Spring 2000): 30p-YH-11

35. Application of Solid-State NMR to the State Analysis of Silicon-Based Compounds

• Mikio Aramata
• Shin-Etsu Chemical Co., Ltd., Gunma Plant
• The 26th Solid-State NMR and Materials Research Meeting (May 8, 2000, Kyoto Heian Kaikan)

36. Study of the Calcination Process and Surface State of HfO₂ Thin Films by Temperature-Programmed Desorption

• Kinya Adachi, Toshikazu Nishide, *Nobuyoshi Miyabayashi, *Makiko Sano
• Nihon Univ. (Eng.), *Electron Sci.
• Proceedings of the 36th Thermal Analysis Symposium, 90 (Fall 2000)

37.Study of Surface States in CeO₂ Thin Films Using Thermal Desorption

• Toshikazu Nishide, Satoko Tokiwa, *Nobuyoshi Miyabayashi, *Makiko Sano, **Chika Sato
• Nihon Univ. (Faculty of Engineering), *Department of Electronic Science, **Nissan Arc Co., Ltd.
• Proceedings of the 36th Thermal Analysis Symposium, 92 (Fall 2000)

38. Surface Analysis of Metal Oxide Thin Films Using TDS

• Toshikazu Nishide
• College of Engineering, Nihon University
• Proceedings of the 8th TMS Workshop p4 (2000.4.28)